Effect of deposition of Al2O3 as interdiffusion barrier on the microstructure and optical properties of Ti thin film.
Abd El Fattah, H., Abdelfatah, A., Elmahallawi, I., Ibrahim, A., Mohamed, L. (2025). Effect of deposition of Al2O3 as interdiffusion barrier on the microstructure and optical properties of Ti thin film.. EKB Journal Management System, 68(2), 27-37. doi: 10.21608/ejchem.2024.275380.9420
Hanan Abd El Fattah; Aliaa Abdelfatah; Iman Elmahallawi; Ahmed Ibrahim; Lamiaa Z. Mohamed. "Effect of deposition of Al2O3 as interdiffusion barrier on the microstructure and optical properties of Ti thin film.". EKB Journal Management System, 68, 2, 2025, 27-37. doi: 10.21608/ejchem.2024.275380.9420
Abd El Fattah, H., Abdelfatah, A., Elmahallawi, I., Ibrahim, A., Mohamed, L. (2025). 'Effect of deposition of Al2O3 as interdiffusion barrier on the microstructure and optical properties of Ti thin film.', EKB Journal Management System, 68(2), pp. 27-37. doi: 10.21608/ejchem.2024.275380.9420
Abd El Fattah, H., Abdelfatah, A., Elmahallawi, I., Ibrahim, A., Mohamed, L. Effect of deposition of Al2O3 as interdiffusion barrier on the microstructure and optical properties of Ti thin film.. EKB Journal Management System, 2025; 68(2): 27-37. doi: 10.21608/ejchem.2024.275380.9420