Comparison between the optical properties of TiO2 and ZnO thin films deposited using Dc plasma sputtering and pulsed laser deposition | ||||
| Journal of Basic and Environmental Sciences | ||||
| Volume 5, Issue 2, April 2018, Page 93-100 PDF (418.98 K) | ||||
| Document Type: Original Article | ||||
| DOI: 10.21608/jbes.2024.370411 | ||||
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| Authors | ||||
| A. A. Salih1; M. H. Makled2; T. Y. Elrsasi2; M. A. Hassoba2; G. A. Al-Dahash3 | ||||
| 1Ministry of Electricity, Iraq | ||||
| 2Depertment of physics, Faculty of science, Benha University, P. O. Box13518 Benha, Egypt | ||||
| 3Department of physics, Faculty of science, Babylon University, Babylon, Iraq | ||||
| Abstract | ||||
| TiO2 and ZnO thin films were deposited using two different techniques, DC magnetron plasma sputtering and pulsed laser deposition, on glass substrates at different powers. The optical properties concerning the absorption, reflection and transmission spectra were studied for the deposited thin films. Noticeable enhancement for all optical properties was noticed for PLD thin films. The surface morphology of the deposits materials has been studied using atomic force microscope (AFM). The average surface roughness increasing from 3 by sputtering to 7 by PLD for TiO2 thin films and from 1 by sputtering to 9 by PLD for ZnO thin films. | ||||
| Keywords | ||||
| optical films; Zinc oxide; Titanium Oxide; plasma deposition. Laser deposition | ||||
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