Low Frequency Glow Discharge Sources as an Impressive Technique for Different Applications: A mini review article | ||||
| Arab Journal of Nuclear Sciences and Applications | ||||
| Volume 58, Issue 2, April 2025, Page 1-8 PDF (638.6 K) | ||||
| Document Type: Original Article | ||||
| DOI: 10.21608/ajnsa.2025.338422.1862 | ||||
 View on SCiNiTO | ||||
| Author | ||||
Waleed Ghaly  
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| Department of Physical Sciences, College of Science, Jazan University, P.O. Box. 114, Jazan 45142, Kingdom of Saudi Arabia | ||||
| Abstract | ||||
| Low-Frequency (LF) glow discharge has been used for different applications such as plasma chemical vapor deposition (PCVD) of thin films, medical treatment applications such as disinfection , wound healing and industry of recombinant proteins. LF glow discharge source is regard as an inexpensive simple construction, easy to operate and low consumption power compared with High-Frequency (HF) and Direct current (DC) glow discharge sources. Highlight of recent advances in using LF glow discharge source in previous applications are demonstrated in this article. In the first section, the working principles of DC, HF and LF gas discharge are covered, along with a comparison of the three techniques. The advancements of LF gas discharge in thin film deposition PCVD and in medical treatment are discussed in the following section. Finally, a variety of computer simulation models of LF-PECVD technique and Cold atmospheric plasma CAP, which can be generated by LF, are presented for the previous applications. | ||||
| Keywords | ||||
| Low-Frequency glow discharge; Low-Frequency pulsed discharge; Radio-Frequency plasma; plasma chemical vapor deposition; Cold atmospheric plasma CAP; Review | ||||
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