Nitrogen Plasma Effect On The Physical Properties Of Tin Oxide Thin Film | ||||
| Egyptian Journal of Solids | ||||
| Article 1, Volume 34, Issue 1, 2011, Page 7-18 PDF (1.46 MB) | ||||
| DOI: 10.21608/ejs.2011.148856 | ||||
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| Abstract | ||||
| An enhancement of structural, optical and electrical properties of tin oxide thin films could be obtained by exposing these films to DC pseudo nitrogen plasma. The films were prepared by spray pyrolysis method, and then the properties are measured at different exposure times of plasma. It is found that the exposure time (~ 15 minutes) enhances the transmittance of the tin oxide while larger times decrease it. Also, it is found that; there is a dramatic change in thickness, optical band gap and the resistivity with changing the exposure time. | ||||
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