Structural properties of Ag-CuO thin films on silicon prepared via DC magnetron sputtering | ||||
| Egyptian Journal of Chemistry | ||||
| Article 61, Volume 65, Issue 4, April 2022, Page 685-691 PDF (1.36 MB) | ||||
| Document Type: Original Article | ||||
| DOI: 10.21608/ejchem.2021.91367.4348 | ||||
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| Authors | ||||
zahra Abed  1; Rajaa K. Mohammad2; Abdulhussain Elttayef3
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| 1Department Physics, College of Science, University of Kerbala-56001, Iraq | ||||
| 2Chemistry Department, College of Science, University of Misan, Misan | ||||
| 3Ministry of Science and Technology, Baghdad- 10065 ,Iraq | ||||
| Abstract | ||||
| In this paper, 3% and 5 % of Ag doped copper oxide (CuO) deposited onto silicon substrates as thin film using the DC magnetron sputtering process under Ar gas. The sputtering deposition was performed by using a power of 75 W. XRD results conformed a good crystallinity of the synthesized Ag/CuO nanoparticle thin films. SEM analysis indicated to all the prepared samples are having a quasi-spherical shape. Based on AFM analysis, the roughness of prepared samples determined and found the high roughness of 3% Ag/CuO sample that attitude to have it a less mean crystal size compated with 5% Ag/CuO, which calculated using Scherrer equation. The EDX spectra indicated the high purities for the prepared sample befor and after deposted on Si as substrate | ||||
| Keywords | ||||
| Ag/CuO; FE-SEM; Magnetron Sputtering; CuO; Nanoparticle; EDX; Thin film | ||||
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