Study of The Photostbilization Of Polystyrene In The Presence And Absence Of Schiff Base Derivatives | ||||
| Egyptian Journal of Chemistry | ||||
| Article 60, Volume 65, Issue 4, April 2022, Page 675-683 PDF (934.12 K) | ||||
| Document Type: Original Article | ||||
| DOI: 10.21608/ejchem.2021.80165.3962 | ||||
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| Authors | ||||
| Zainab N. Mageed1; Shurooq S. Kadhium2; Wafaa F. Rodhan2; Hamid H. Mohammed2 | ||||
| 1Unit of research polymer, College of Science, Mustansiriya University, Baghdad, Iraq | ||||
| 2Department of Chemistry, College of Science, Mustansiriya University, Baghdad, Iraq | ||||
| Abstract | ||||
| The initiated photodegradation of polystyrene films notice able all around were examined (for 400 hrs.) in the being and absence of Schiff bases for benzoxazin product compounds by quickened weathering analyzer. The adding of (0.1% wt/v) of organic compounds to polystyrene films (thickness, 25µm) diminished the degradation of the polystyrene. The rate of degradation was trailed by an expansion in absorbtion of carbonyl for polymers utilizing viscosity, I.R., and UV spectra estimation. As per the results, the initiated degradation instruments of polystyrene films were recommended under the exploratory term utilized utilizing temperature 45 oC, radiation of UV at λ = 313 nm , illumination force 3.49x10-5 einsteins.dm-3.S-1. | ||||
| Keywords | ||||
| Key words: photodegradation; photostabilization; polystyrene | ||||
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