Nucleation of Silicon Dioxide Nanoparticles in the Film-Forming Tetraethoxysilane Solution
Pavliashvili, T., Tutunjyan, A., Akhvlediani, Z., Tsertsvadze, G. (2017). Nucleation of Silicon Dioxide Nanoparticles in the Film-Forming Tetraethoxysilane Solution. EKB Journal Management System, 3(2), 14-16. doi: 10.18576/jpac/030302
T. Pavliashvili; A. Tutunjyan; Z. Akhvlediani; G. Tsertsvadze. "Nucleation of Silicon Dioxide Nanoparticles in the Film-Forming Tetraethoxysilane Solution". EKB Journal Management System, 3, 2, 2017, 14-16. doi: 10.18576/jpac/030302
Pavliashvili, T., Tutunjyan, A., Akhvlediani, Z., Tsertsvadze, G. (2017). 'Nucleation of Silicon Dioxide Nanoparticles in the Film-Forming Tetraethoxysilane Solution', EKB Journal Management System, 3(2), pp. 14-16. doi: 10.18576/jpac/030302
Pavliashvili, T., Tutunjyan, A., Akhvlediani, Z., Tsertsvadze, G. Nucleation of Silicon Dioxide Nanoparticles in the Film-Forming Tetraethoxysilane Solution. EKB Journal Management System, 2017; 3(2): 14-16. doi: 10.18576/jpac/030302

Nucleation of Silicon Dioxide Nanoparticles in the Film-Forming Tetraethoxysilane Solution

Journal of Pharmaceutical and Applied Chemistry
Volume 3, Issue 2, September 2017, Page 14-16  XML PDF (671.8 K)
Document Type: Original Article
DOI: 10.18576/jpac/030302
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Authors
T. Pavliashvili1; A. Tutunjyan1; Z. Akhvlediani2; G. Tsertsvadze3
1Institute of Micro-and Nanoelectronics, 13 Ilia Chavchavadze Avenue, 0179, Tbilisi, Georgia.
2I.Javakhishvili Tbilisi State University, 3 Ilia Chavchavadze Avenue, 0128, Tbilisi, Georgia.
3Georgian Technical University, 77Merab Kostava Avenue, 0175 Tbilisi, Georgia.
Abstract
The nucleation process of silicon dioxide nanoparticles in tetraethoxysilane solutions is studied. For the investigation, infrared spectrometry, optical and transmission electron microscopy was used. Size distribution of nanoparticles was determined and corresponding histograms were plotted.

Keywords
Nucleation, silicon dioxide nanoparticles; Transmission electron microscopy, IR spectroscopy; tetraethoxysilane
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