EFFECT OF ANNEALING TEMPERATURE ON THE REFRACTIVE INDEX OF TITANIUM DIOXIDE (TIO2) THIN FILMS DEPOSITED BY THERMAL EVAPORATION TECHNIQUE | ||||
| Assiut University Journal of Multidisciplinary Scientific Research | ||||
| Volume 46, Issue 1, June 2017, Page 1-10 PDF (479.98 K) | ||||
| Document Type: Novel Research Articles | ||||
| DOI: 10.21608/aunj.2017.221401 | ||||
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| Abstract | ||||
| Titanium dioxide (TiO2) has attracted much attention in the past decades. TiO2 thin films were prepared using vacuum thermal evaporation technique and then heat treated at different annealing temperatures. An optical characterization method, based only on the transmission spectra at normal incidence of uniform thin films, was used to obtain the refractive index n. The dispersion of n is discussed in terms of the single-oscillator Wemple and DiDomenico model. The dispersion parameters, and decreases after annealing at different temperatures for 3h. The obtained results were discussed in terms of an increasing the packing density of the deposited films after annealing treatment. | ||||
| Keywords | ||||
| Thin films; Oxide semiconductor; Titanium dioxide; Refractive index | ||||
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