Reduced Graphene Oxide @ Magnetite Nanocomposite and ELFEF effect on Staphylococcus aureus growth inhibition

Mostafa, Marwa M.; Mohamad, Ebtesam A.; Ramadan, Marwa A.; Elneklawi, Mona S.

doi:10.21608/ejchem.2022.157530.6825

	Reduced Graphene Oxide @ Magnetite Nanocomposite and ELFEF effect on Staphylococcus aureus growth inhibition
Egyptian Journal of Chemistry
Article 28, Volume 66, Issue 6, June 2023, Page 267-278 PDF (1013.45 K)
Document Type: Original Article
DOI: 10.21608/ejchem.2022.157530.6825
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Authors
Marwa M. Mostafa¹; Ebtesam A. Mohamad ¹; Marwa A. Ramadan²; Mona S. Elneklawi ³
¹Biophysics Department, Faculty of Science, Cairo University, Giza, Egypt
²Department of Photochemistry Photobiology, National Institute for Laser Enhanced Science (NILES) Cairo University, Cairo, Egypt
³Department of Biomedical Equipment, Faculty of Applied Medical Sciences, October 6 University, Giza, Egypt.
Abstract
Background: Staphylococcus aureus (S. aureus) is well known as a Gram-positive pathogen that is leads to many chronic and recurrent infectious conditions such as skin infections. The microbial organism showed high resistance to some antibiotic classes. Extremely low frequency electric field (ELFEF) shows promising effect with antimicrobial activity. Nanoparticles represent a powerful tool against microbial growth. Methods: Because of lack of ways of protection mechanisms against S. aureus the present study conducted first: S. aureus characteristics such as the growth curve, biofilm formation and antimicrobial susceptibilities and resistance mechanisms, second: the effect of reduced graphene oxide @ magnetite nanocomposite (rGO@Fe3O4) and extremely low frequency electric field (ELFEF) as inhibition mechanisms for S. aureus growth rate. Results: S. aureus was affected by using rGO@Fe3O4 showing high growth inhibition of S. aureus in comparison with ELFEF which represent lower inhibitory effect than rGO@Fe3O4 while the emerging between ELFEF and rGO@Fe3O4 shows impressive results as a great factor in the inhibition of S. aureus and it was shown by screening its susceptibility test and biofilm formation ability. Conclusion: The rate of S. aureus growth inhibition was sustained by using both rGO@Fe3O4 and ELFEF as antimicrobial factors for slowing down or inhibiting S. aureus microbial viability as a pathogen.
Keywords
S. aureus; susceptibility test; biofilm formation; rGO@Fe3O4; and extremely low frequency electric field


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