Characterization of ZnS Nano layers produced by pulsed laser deposition | ||||
| International Journal of Artificial Intelligence and Emerging Technology | ||||
| Volume 5, Issue 2, December 2022, Page 36-48 PDF (390.15 K) | ||||
| Document Type: Original Article | ||||
| DOI: 10.21608/ijaiet.2022.278620 | ||||
 View on SCiNiTO | ||||
| Authors | ||||
| Nehal ALi1; A. Abou El Magd1; Y. badr2 | ||||
| 1Department of Engineering Physics and Mathematices, Faculty of Engineering, Tanta University | ||||
| 2National Institute of Laser Enhanced Sciences, Cairo University | ||||
| Abstract | ||||
| Pulsed Laser Deposition, PLD technique was used to fabricate ZnS thin films deposited on crystalline substrate of Al2O3 under high vacuum condition. The deposition conditions were optimized. The laser induced plasma LIP, spectroscopic technique was used to diagnose the plasma produced by laser ablation. Elemental analysis by energy dispersive X-ray spectroscopy (EDX) indicates higher S content in ZnS films produced at higher fluence. Interferometery was used to measure the thickness of the films, UV/VIS absorption as will as fluorescence spectroscopy was carried out on both thin layers and bulk samples. Blue shift was obtained in absorption and emission spectra indicating the confinement of the film. | ||||
| Keywords | ||||
| ZnS; PLD; thin film; LIP | ||||
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