Antibiotic sensitivity profile of microorganisms isolated from used and unused nose masks | ||||
Microbes and Infectious Diseases | ||||
Articles in Press, Accepted Manuscript, Available Online from 26 November 2023 PDF (1.13 MB) | ||||
Document Type: Original Article | ||||
DOI: 10.21608/mid.2023.243175.1647 | ||||
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Authors | ||||
Kehinde Elizabeth Adeleye ; Anthony Kayode Onifade | ||||
Department of Microbiology, School of Life Sciences, Federal University of Technology, Akure, Nigeria. | ||||
Abstract | ||||
Background: Nose masks may harbor organisms found on the skin and nasal region that may become opportunistic or vehicles for disease transmission. This investigation was designed to identify the patterns of bacteria and fungi isolated from used and unused nose masks regarding antibiotic susceptibility. Methods: A total of 25 used nose mask samples and 50 unused nose masks were obtained from the Akure South region of Ondo State. Antimicrobial sensitivity testing was carried out on the isolated microorganisms. Most of the organisms isolated were known as human microflora. Results: The most predominant organisms isolated were Bacillus sp. (bacteria) and Aspergillus sp. (fungi). Results revealed that Bacillus was sensitive to the drugs administered for Gram-positive bacteria, while Micrococcus was resistant. Also, the Gram-positive bacteria showed high sensitivity to septrin and erythromycin but were resistant to zinnacef. Proteus exhibited high sensitivity to the antibiotics administered for Gram-negative bacteria, while Yersinia was resistant. The Gram-negative bacteria were highly sensitive to septrin, but resistant to ciprofloxacin and tarvid. Conclusions: Generally, antibiotics were more effective against Gram-positive bacteria than Gram-negative bacteria. The antifungal assay demonstrated that Neurospora sitophila was resistant to the administered antifungal drugs, while Mucor mucedo showed high susceptibility to antifungal drugs. | ||||
Keywords | ||||
Antibiotics; antifungal; bacteria; susceptibility; resistance | ||||
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